On-site Fluorine generation

The Semiconductor, TFT-LCD, and Photo-Voltaic industries have been rapidly increasing their global consumption of PFC (perfluorocarbon) gases as a source of Fluorine radicals for process chamber cleaning. Unlike PFC's, elemental Fluorine (F2) has no global warming potential and is fundamentally lower cost to manufacture than gases derived from Fluorine. In addition, handling and safety concerns make F2 supply via high-pressure cylinders unattractive.

Low-pressure on-site fluorine generation and delivery provide an environmentally friendly and cost effective alternative for the safe and reliable supply of F2 to both thermally activated and plasma-enhanced CVD process chamber cleaning.

Linde Group has developed the Generation-F® range of integrated fluorine chamber cleaning solutions that incorporate gas generation, storage, delivery, abatement and complementary maintenance and service solutions.

  • The Generation-F®80 is our Semiconductor market on-site fluorine generator for Thermal / LPCVD chamber cleaning.
  • The Generation-F® 400 supports the demands of lower generation Flat Panel Display (FPD) and Photo-Voltaic (PV) process tools
  • The Generation-F® 1600 is our largest on-site fluorine generator, meeting the needs of larger demands from the FPD and PV/Solar industries, for Generation 5 and above.

If you have any queries please email us at electronicsinfo@linde.com .